THE FABRICATION OF A PHOTONIC CRYSTAL BASED THREE CHANNEL WAVELENGTH DIVISON DEMULTIPLEXER (WDDM) DEVICE

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dc.contributor.advisor Yarrison-Rice, Jan M. en_US
dc.contributor.author Cao, Siwei en_US
dc.date.accessioned 2009-04-10T10:16:52Z
dc.date.available 2009-04-10T10:16:52Z
dc.date.created 2008 en_US
dc.date.issued 2009-04-10T10:16:52Z
dc.identifier.uri http://rave.ohiolink.edu/etdc/view?acc_num=miami1219330454 en_US
dc.identifier.uri http://hdl.handle.net/2374.OX/108510
dc.description We introduce a model of a high efficiency photonic lattice based 3-channel wavelength division demultiplexer (WDDM). A 2-D photonic crystal structure is within Si3N4 layer is fabricated within air cladding on top and SiO2 beneath. The photonic crystal used for the WDDM device has a lattice constant of 213nm and air pores of 150nm in diameter. We also devise and present a full fabrication process to fabricate a three-channel WDDM device. Electron-beam lithography is successful and the results are reported. Some problems were encountered with Cr wet etch, and the results are reported. Also, a recipe for Si3N4 plasma etching is presented. en_US
dc.format application/pdf en_US
dc.format 73p. en_US
dc.rights unrestricted en_US
dc.rights Copyright and permissions information available at the source archive en_US
dc.subject WDDM en_US
dc.subject photonic crystal en_US
dc.subject E-beam lithography en_US
dc.subject Cr wet etch en_US
dc.subject plasma etch en_US
dc.title THE FABRICATION OF A PHOTONIC CRYSTAL BASED THREE CHANNEL WAVELENGTH DIVISON DEMULTIPLEXER (WDDM) DEVICE en_US
dc.type Electronic Thesis or Dissertation en_US
dc.degree.name MS en_US
dc.degree.level masters en_US
dc.degree.discipline Physics en_US
dc.degree.grantor Miami University en_US
dc.contributor.publisher Miami University / OhioLINK en_US

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