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| dc.contributor.advisor | Yarrison-Rice, Jan M. | en_US |
| dc.contributor.author | Cao, Siwei | en_US |
| dc.date.accessioned | 2009-04-10T10:16:52Z | |
| dc.date.available | 2009-04-10T10:16:52Z | |
| dc.date.created | 2008 | en_US |
| dc.date.issued | 2009-04-10T10:16:52Z | |
| dc.identifier.uri | http://rave.ohiolink.edu/etdc/view?acc_num=miami1219330454 | en_US |
| dc.identifier.uri | http://hdl.handle.net/2374.OX/108510 | |
| dc.description | We introduce a model of a high efficiency photonic lattice based 3-channel wavelength division demultiplexer (WDDM). A 2-D photonic crystal structure is within Si3N4 layer is fabricated within air cladding on top and SiO2 beneath. The photonic crystal used for the WDDM device has a lattice constant of 213nm and air pores of 150nm in diameter. We also devise and present a full fabrication process to fabricate a three-channel WDDM device. Electron-beam lithography is successful and the results are reported. Some problems were encountered with Cr wet etch, and the results are reported. Also, a recipe for Si3N4 plasma etching is presented. | en_US |
| dc.format | application/pdf | en_US |
| dc.format | 73p. | en_US |
| dc.rights | unrestricted | en_US |
| dc.rights | Copyright and permissions information available at the source archive | en_US |
| dc.subject | WDDM | en_US |
| dc.subject | photonic crystal | en_US |
| dc.subject | E-beam lithography | en_US |
| dc.subject | Cr wet etch | en_US |
| dc.subject | plasma etch | en_US |
| dc.title | THE FABRICATION OF A PHOTONIC CRYSTAL BASED THREE CHANNEL WAVELENGTH DIVISON DEMULTIPLEXER (WDDM) DEVICE | en_US |
| dc.type | Electronic Thesis or Dissertation | en_US |
| dc.degree.name | MS | en_US |
| dc.degree.level | masters | en_US |
| dc.degree.discipline | Physics | en_US |
| dc.degree.grantor | Miami University | en_US |
| dc.contributor.publisher | Miami University / OhioLINK | en_US |
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