Cleanroom establishment and processing implementation for electron drag

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Title:	Cleanroom establishment and processing implementation for electron drag
Author:	Ragucci, Anthony J
Description:	The complete specification, design, and implementation of a class 100 cleanroom is described in addition to the sample processing used therein to generate electron drag samples. The 250 ft ^2 cleanroom is designed to utilize the available infrastructure in a fifty-year-old building that was not originally intended to support a cleanroom. Nontraditional approaches are used to reduce construction costs to 1/4 the amount required using a standard modular solution. The room is equally divided into class 1,000 and class 100 areas. A total of 12 linear feet of vented hood space are included and the environment is both temperature and humidity controlled to within ±1°F and ±5% RH. Processing of electron drag samples is described starting from an epitaxially-grown double-quantum-well wafer through wiring. New methods are discussed to increase the reliability of the process and to reduce reliance on user skill. Low resistance, repeatable contacts are established. Also, the parallelism of a back-side sample etch is improved by a factor of 20 over previously used methods.
Permanent Link:	http://rave.ohiolink.edu/etdc/view?acc_num=osu1093710402 http://hdl.handle.net/2374.OX/5063
Date:	2004

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